Room temperature bonding of silicon and lithium niobate
· temperature. The CTE mismatch depends on the orientation of LiNbO 3. These CTE levels do not allow direct wafer bonding at high temperatures due to thermal stresses across the interface. The calculation for CTE mismatch was based on the reported literature CTE values of 2.6 −610 /K and 7.5 c axis –14.4 a axis 10−6/K for Si and LiNbO 3 re-
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· We find however that there is a mismatch with reference data—recommended by the Committee on Data for Science and Technology in 1985 12 for polycrystalline silicon—in the 90–230K temperature range. 13 As SCS is commonly used as a reference material for thermal expansion studies we suggest therefore that the results of our work 9 should be used as updated reference information
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· modulus of silicon as 1.9 1012 dynes/cm2 (i.e. 190 GPa) with a footnote that directs readers to a textbook 5 on mate-rials for further information on silicon anisotropy. This value is simply the maximum possible E value for silicon rounded up. Later in the same paper as an example of a device made from
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0.11. Single crystal silicon<100> p type sliding against a spherical diamond tip (radius=20um)at 10 mN normal load 7.0 mmstroke length 0.1 Hz frequency and 1.0 mm/sec average linear speed for a sliding distance of 4m under an ambient temperature of about 22 -1 C and a
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· CTE also comes in to play when using large silicon chip packages that are soldered on to a board. The chip packages usually have a CTE of about 6 ppm/°C which is lower than the CTE of the PCB. When the board is heated the package will expand less than the board and can result in a bad solder joint connection which will hamper the performance
Get PriceLinear Thermal Expansion Coefficient of Silicon from 293
As a part of the program to establish a thermal expansion standard the linear thermal expansion coefficients of single-crystal silicon have been determined in the temperature range 293 to 1000 K using a dilatometer which consists of a heterodyne laser Michelson interferometer and gold versus platinum thermocouple. The relative standard deviation of the measured values from those calculated
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· Thermal expansion coefficient of polycrystalline silicon and silicon dioxide thin films at high temperatures Haruna Tada Amy E. Kumpel Richard E. Lathrop and John B. Slanina Thermal Analysis of Materials Processing Laboratory Tufts University
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· Learn about product property Coefficient of Thermal Expansion. is the global leading manufacturer of superior precision Fine Ceramics (Advanced Ceramics).
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· that of the ferrous metals. The average CTE for commercially pure metal is 24 10–6/K (13 10–6/°F). Aluminum alloys are affected by the presence of silicon and copper which reduce ex-pansion and magnesium which increases it. Its high expansion should be considered when alu-minum is used with other materials especially in
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· Common low CTE materials like Copper Tungsten (CuW) Aluminum-Silicon-Carbide (AlSiC) Kovar etc. which are commonly used in RF packaging do not offer cost advantages in high volume consumer electronics. Figure 1. Thermal conductivity as a function of coefficient of thermal expansion (CTE) at room temperature (from J.E. Sergent and A. Krum
Get PriceCoefficients of Linear Thermal Expansion
· Coefficients of Linear Thermal Expansion. When an object is heated or cooled its length change by an amount proportional to the original length and the change in temperature. Thermal expansion coefficients for some common materials Most values for temperature 25 oC (77 oF). The span in the values may be caused by the variation in the
Get PriceThe General Properties of Si Ge SiGe SiO2 and Si3N4
· The following table summarizes many of the basic physical properties of Silicon Germanium and Silicon Germanium at different concentrations. The concentrations are given in the form of Si1-xGex where x represents the percent composition of Germanium. Properties Ge Si.25Ge.75 Si.5Ge.5 Si.75Ge.25 Si Atoms/cm3 4.42 x 1022 Ge
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· The dimensional change of aluminum and its alloys with a change of temperature is roughly twice that of the ferrous metals. The average CTE for commercially pure metal is 24 10 –6 /K (13 10 –6 /°F). Aluminum alloys are affected by the presence of silicon and copper which reduce expansion and magnesium which increases it.
Get PriceMaterial Silicon (Si) bulk
0.11. Single crystal silicon<100> p type sliding against a spherical diamond tip (radius=20um)at 10 mN normal load 7.0 mmstroke length 0.1 Hz frequency and 1.0 mm/sec average linear speed for a sliding distance of 4m under an ambient temperature of about 22 -1 C and a
Get PriceGlass Wafer Mechanical Properites A Comparison To Silicon
Silicon wafers are very common in wafer fabrication facilities. A silicon carrier wafer is a very close match to the device substrate wafer. A silicon carrier wafer can be a lower grade wa- (CTE) must be carefully chosen. If there is too much warp a 300 mm diameter wafer stack may not slide in and out of the
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· Rearranging terms CTE = (∆L/L)/∆T = ε /∆T where ε is the mechanical strain. Elastic Modulus This could be described as the "stiffness" of a material. It is represented by the symbol M. In a uniaxial stress situation it equals the ratio of the stress to the strain or M = σ / ε. The stress between two bonded components depends
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· High CTE IR and UV applicationswindows filters and prisms Magnesium Fluoride Wide transmission range Birefringent Birefringent larger anisotropic CTE Common anti-reflection coating UV optics Borofloat Borosilicate Low CTE CTE matches Silicon can be made very flat Poor optical properties Applications needed thermal stability
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· that of the ferrous metals. The average CTE for commercially pure metal is 24 10–6/K (13 10–6/°F). Aluminum alloys are affected by the presence of silicon and copper which reduce ex-pansion and magnesium which increases it. Its high expansion should be considered when alu-minum is used with other materials especially in
Get PriceWhat is the Young s Modulus of Silicon
· modulus of silicon as 1.9 1012 dynes/cm2 (i.e. 190 GPa) with a footnote that directs readers to a textbook 5 on mate-rials for further information on silicon anisotropy. This value is simply the maximum possible E value for silicon rounded up. Later in the same paper as an example of a device made from
Get PriceBasic Mechanical and Thermal Properties of Silicon
· This paper outlines some of the basic mechanical and thermal properties of silicon. B Crystalline Structure and Elastic Properties Three values for the lattice parameter of pure Silicon at 22.500 °C are given below. The values were determined in independent studies through X-ray and optical interferometry (XROI). a= 543102.032 /- 0.033 fm 2
Get PriceRoom temperature bonding of silicon and lithium niobate
· temperature. The CTE mismatch depends on the orientation of LiNbO 3. These CTE levels do not allow direct wafer bonding at high temperatures due to thermal stresses across the interface. The calculation for CTE mismatch was based on the reported literature CTE values of 2.6 −610 /K and 7.5 c axis –14.4 a axis 10−6/K for Si and LiNbO 3 re-
Get PriceThermal expansion coefficients and composition of sputter
· Thermal expansion coefficients and composition of sputter-deposited silicon oxynitride thin films. I R McKerracher 1 L Fu 1 H H Tan 1 and C Jagadish 1. Published 5 August 2010 • 2010 IOP Publishing Ltd Journal of Physics D Applied Physics Volume 43 Number 33 Citation I R McKerracher et al 2010 J. Phys. D Appl. Phys. 43 335104
Get PriceWhat is Silicon Silicon Wafer Properties and Information
· About Silicon. Silicon Si The most common semiconductor atomic number 14 energy gap Eg= 1.12 eV- indirect bandgap crystal structure- diamond lattice constant 0.543 nm atomic concentration 5 x 10 22 atoms/cm-3 index of refraction 3.42 density 2.33 g/cm 3 dielectric constant 11.7 intrinsic carrier concentration 1.02 x 10 10 cm-3 mobility of electrons and holes at 300°K 1450
Get PriceThermal expansion coefficients and composition of sputter
· Thermal expansion coefficients and composition of sputter-deposited silicon oxynitride thin films. I R McKerracher 1 L Fu 1 H H Tan 1 and C Jagadish 1. Published 5 August 2010 • 2010 IOP Publishing Ltd Journal of Physics D Applied Physics Volume 43 Number 33 Citation I R McKerracher et al 2010 J. Phys. D Appl. Phys. 43 335104
Get PriceCoefficient of Thermal Expansion (CTE)
16 rows · Coefficient of Thermal Expansion (CTE) The coefficient of thermal expansion for a material
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· Learn about product property Coefficient of Thermal Expansion. is the global leading manufacturer of superior precision Fine Ceramics (Advanced Ceramics).
Get PriceThermal expansion coefficient of polycrystalline silicon
· Thermal expansion coefficient of polycrystalline silicon and silicon dioxide thin films at high temperatures Haruna Tada Amy E. Kumpel Richard E. Lathrop and John B. Slanina Thermal Analysis of Materials Processing Laboratory Tufts University
Get PriceWhat is Silicon Silicon Wafer Properties and Information
· About Silicon. Silicon Si The most common semiconductor atomic number 14 energy gap Eg= 1.12 eV- indirect bandgap crystal structure- diamond lattice constant 0.543 nm atomic concentration 5 x 10 22 atoms/cm-3 index of refraction 3.42 density 2.33 g/cm 3 dielectric constant 11.7 intrinsic carrier concentration 1.02 x 10 10 cm-3 mobility of electrons and holes at 300°K 1450
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· The dimensional change of aluminum and its alloys with a change of temperature is roughly twice that of the ferrous metals. The average CTE for commercially pure metal is 24 10 –6 /K (13 10 –6 /°F). Aluminum alloys are affected by the presence of silicon and copper which reduce expansion and magnesium which increases it.
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